三氟化氮（Nitrogen Trifluoride），化学式NF3，是一种强氧化剂。作为一种重要的工业特种气体，具有广泛的应用领域。
在微电子工业中，三氟化氮是一种优良的等离子蚀刻气体，在半导体芯片、平板显示器、光纤、光伏电池等制造领域，三氟化氮主要用作等离子蚀刻气体和反应腔清洗剂。它还可以用于高能化学激光器，通过与氢反应在瞬间放出大量热来实现其应用。三氟化氮还可用作高能燃料，并且在火箭发射中作为氧化剂和推进剂使用。
Nitrogen trifluoride, chemical formula NF3, is a strong oxidizing agent. As an important industrial special gas, it has a wide range of applications.
In the microelectronics industry, nitrogen trifluoride is an excellent plasma etching gas; In the semiconductor chip, flat panel display, optical fiber, photovoltaic cells and other manufacturing fields, nitrogen trifluoride is mainly used as plasma etching gas and reaction cavity cleaning agent.
It can also be used in high-energy chemical lasers to achieve its application by reacting with hydrogen to emit a large amount of heat in an instant. Nitrogen trifluoride is also used as a high-energy fuel and as an oxidizer and propellant in rocket launches.
